Specification: * Manufacturer: Nikon * Model: NSR-1000 * Year: 2020 * Dimensions: 1000mm x 1000mm * Processing Capacity: 100 wafers/hour * Automation Level: Fully Automated * Control System: Advanced Computer Control * Accuracy: ±0.1um * Temperature Control: -20°C to 400°C * Humidity Control: 5% to 95% * Power Requirements: 220V, 50/60Hz Nikon's NSR-1000 wafer processing equipment is a high-quality solution for semiconductor fabrication. With a processing capacity of 100 wafers per hour and advanced computer control, this equipment ensures accurate and efficient fabrication of semiconductors. The fully automated system allows for easy operation and maintenance, while the temperature and humidity control ensures consistent results. Perfect for use in research and development, as well as mass production, this equipment is a must-have for any semiconductor fabrication facility.